Various aspects of photon-matter interactions are discussed in the frame of
applications to chemical vapor deposition processes. Based on the examples
of carbon and tungsten deposition, the. influences of photon sources like
lamps, pulsed- or cw-lasers on the deposition mechanisms are outlined. Pecu
liarities arising from the different interactions of photons with the gas p
hase and/or the substrate surface and their effect on the compositional or
structural characteristics of the deposited material are described.