In situ characterization of atomic layer deposition of SrTiO3

The reaction mechanisms in the atomic layer deposition of SrO and SrTiO3 We re studied with a quartz crystal microbalance and a quadrupole mass spectro meter at 325 degreesC. The precursors were Sr((C5Pr3H2)-Pr-i)(2), Ti(OCH(CH 3)(2))(4) and deuterated water. The main gaseous byproduct was (C5Pr3H2D)-P r-i. When SrO was grown on TiO2, the TiO2 surface affected the growth until it became covered with SrO. By contrast, the SrO surface did not have as s ignificant effect to the growth of TiO2.