Area selective OMCVD of gold and palladium on self-assembled organic monolayers: Control of nucleation sites

Citation
Ra. Fischer et al., Area selective OMCVD of gold and palladium on self-assembled organic monolayers: Control of nucleation sites, J PHYS IV, 11(PR3), 2001, pp. 1183-1190
Citations number
24
Categorie Soggetti
Physics
Journal title
JOURNAL DE PHYSIQUE IV
ISSN journal
11554339 → ACNP
Volume
11
Issue
PR3
Year of publication
2001
Pages
1183 - 1190
Database
ISI
SICI code
1155-4339(200108)11:PR3<1183:ASOOGA>2.0.ZU;2-6
Abstract
The area selective organometallic chemical vapor deposition (OMCVD) of gold and palladium onto self-assembled monolayers (SAMs) of omega -functionaliz ed long chain alkanethiols and 4'-functionalized biphenylthiols was investi gated. Trimethylphosphine-methylgold (Me3PAuMe) and cyclopentadienyl-allyl- palladium (Cp(allyl)Pd) were used as organometallic precursors. X-ray photo electron spectroscopy (XPS) revealed that in both cases nucleation occurs s electively only on thiol terminated surfaces even at very mild conditions w hereas nucleation is inhibited on methyl- and hydroxy-terminated SAMs. It h as been shown that it is possible to control the number of gold clusters pe r area by depositing gold onto mixed SAMs consisting of biphenylthiol and 4 '-biphenyldithiol with varying molar ratios.