Development of multilayer coatings and spin-off to XRL applications

Authors
Bijkerk, F
Citation
F. Bijkerk, Development of multilayer coatings and spin-off to XRL applications, J PHYS IV, 11(PR2), 2001, pp. 509-510
Citations number
6
Categorie Soggetti
Physics
Journal title
JOURNAL DE PHYSIQUE IV
ISSN journal
11554339 → ACNP
Volume
11
Issue
PR2
Year of publication
2001
Pages
509 - 510
Database
ISI
SICI code
1155-4339(200107)11:PR2<509:DOMCAS>2.0.ZU;2-Q
Abstract
The substantially increased effort on multilayer coating technology, as mot ivated currently by the application of Mo/Si coatings in Extreme UV lithogr aphy, is expected to have a beneficial effect on the technology for multila yer optics in the XUV wavelength range in general. Some examples of new usa ge of multilayer structures in XRL research are given.