Ultrafast hollow cathode triggered capillary discharge device as a strong XUV source

Several modifications of ultrafast capillary discharge devices have been op erated in 3 gases (Xenon, Argon, Methane) at low pressure to obtain XUV rad iation. Combining the features of a transient hollow cathode discharge with the inherent characteristics of the capillary discharge leads to a new sta rting regime different from the standard one. An electron beam being suppor ted by the Hollow Cathode Effect makes the discharge initiating on-axis wit hout any pollution by wall material, The capillary acts only as a limiter. After initiation, the heating process finishes within one ns time scale. Us ing a stored energy of less than 0.5 J, we achieve plasma temperatures high er than 80eV. With respect to future applications, our table top device giv es the edge on other systems like laser produced plasmas or synchrotons. th rough compacity, simplicity and cost effectiveness. With respect to basic r esearch, we are close to the lasing conditions of the recombination scheme. We report on the electric parameters, the spatial and temporal development of the emitting source and the time-resolved XUV-spectroscopy including rad iance analysis.