Surface smoothing by energetic cluster impact

Citation
O. Rattunde et al., Surface smoothing by energetic cluster impact, J APPL PHYS, 90(7), 2001, pp. 3226-3231
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
90
Issue
7
Year of publication
2001
Pages
3226 - 3231
Database
ISI
SICI code
0021-8979(20011001)90:7<3226:SSBECI>2.0.ZU;2-P
Abstract
This article reports on experimental observations of surface smoothing by h igh energy cluster impact. Thin films have been produced by energetic clust er impact deposition (ECI), and the surface roughness and the power spectru m of the films have been measured by atomic force microscopy. By depositing large metal clusters onto an initially rough substrate, the surface roughn ess is significantly reduced. On the other hand, the roughness of initially smooth surfaces increases only logarithmically. Results for both surface r oughness and power spectrum can be quantitatively explained by a recently d eveloped mesoscopic model for the ECI process employing a stochastic differ ential equation. In this model the smoothing effect results from a downhill particle current (consisting of both cluster and surface atoms) transferri ng the higher lying parts of the surface profile into the valleys. (C) 2001 American Institute of Physics.