A. Goessl et al., Plasma lithography - thin-film patterning of polymeric biomaterials by RF plasma polymerization I: Surface preparation and analysis, J BIOM SC P, 12(7), 2001, pp. 721-738
Plasma lithography, combining plasma deposition with photolithography, is d
escribed as a versatile method to manufacture all-polymeric substrates with
thin-film patterns for applications in biomedical engineering. Patterns of
a hydrophobic fluorocarbon plasma polymer with feature sizes between 5 and
100 mum were deposited on a base substrate in a lift-off process; an inter
-mediate tetraglyme plasma polymer layer provides non-fouling properties to
the base substrate, Careful analysis of critical process parameters identi
fied the narrow window of process conditions that led to the formation of f
unctional surface patterns. High pattern fidelity, aspect ratios, and resol
ution of the patterns are demonstrated by atomic force microscopy. Electron
spectroscopy for chemical analysis (ESCA) and secondary ion mass spectrosc
opy (SIMS) were used to characterize the surfaces, showing good retention o
f the original chemical structure of the pattern components throughout the
process. SIMS imaging was used for specific chemical imaging of the compone
nts. Potential applications for the patterned polymer films, e.g., for stud
ying cell behavior in vitro in dependence of shape and size of adhering cel
ls, are discussed.