We performed ab initio calculations to study the structure and the relative
stability of hydrogenated GaN(0001) surfaces which may form during the gro
wth of gallium nitride using an NH3 nitrogen source. The surfaces that we h
ave studied contain H ad-atoms and NH2 ad-complexes adsorbed on GaN(0001).
We find that adsorption of H, alone or accompanied by other species, stabil
izes the surface of GaN and is able to catalyze the formation of an ideal-l
ike geometry. We give an interpretation of this effect in terms of the elec
tron band structure. Our results suggest, on microscopic grounds. that roug
h surfaces are formed by metal organic chemical vapor deposition under N-ri
ch conditions. Ga-rich and H-rich conditions are suggested for the attainme
nt of high quality films.