Using x-ray diffraction. cross-sectional transmission electron microscopy (
XTEM), and infrared absorption techniques, we have investigated the effects
of nanocrystallization on the structural and optical properties of GaAs0.9
9N0.01 grown by plasma-enhanced molecular-beam epitaxy. The x-ray diffracti
on results of postgrowth annealed samples with a protective Si3N4 cap exhib
it significant lattice relaxation. structural inhomogeneity, and apparent n
itrogen "loss," indicating the occurrence of phase separation after thermal
treatment. High-resolution XTEM confirms the formation of N-enriched GaAsN
nanocrystals embedded at the GaAsN/Si3N4 interface, Infrared absorption st
udy demonstrates that the annealed sample has a strongly enhanced direct op
tical transition.