Analysis of the temperature and excitation intensity dependencies of photoluminescence in undoped GaN films - art. no. 115205

Citation
Ma. Reshchikov et Ry. Korotkov, Analysis of the temperature and excitation intensity dependencies of photoluminescence in undoped GaN films - art. no. 115205, PHYS REV B, 6411(11), 2001, pp. 5205
Citations number
35
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B
ISSN journal
01631829 → ACNP
Volume
6411
Issue
11
Year of publication
2001
Database
ISI
SICI code
0163-1829(20010915)6411:11<5205:AOTTAE>2.0.ZU;2-2
Abstract
Steady-state photoluminescence (PL) from undoped wurtzite GaN has been stud ied in detail over a wide range of temperatures and excitation intensities. Both the observed steps in the temperature dependence of the PL intensity, and the nonlinear dependence of the PL intensity on excitation power for d ifferent PL bands are quantitatively explained by competition between diffe rent recombination channels. Hole-Capture cross sections, defect concentrat ions, and thermal activation energies of the main acceptors in undoped GaN are estimated from the analysis of temperature and excitation intensity dep endencies of the PL.