Surface modification of a polymer film by cryogenic laser ablation of organosilicon compounds

An organosilicon compound, hexamethylcyclotrisilazane (HMCTS), was photolyz ed in a solid film at 84 K with an ArF excimer laser. A polymeric film was prepared as a result of polymerization and/or crosslinking using a reactive species such as 1-(methyslilyl)methanimine, generated by photolysis. At ro om temperature in air, the film changed into a polymer having siloxane unit s. However, fragments generated by laser irradiation of HMCTS in the frozen film made a similar polymer film having a siloxane structure on a PVA film in air. The polymeric film with siloxane units prepared by the cryogenic l aser ablation method displayed hydrophobic properties.