Misfit dislocations at Si1-xGex/Si interfaces have been imaged by x-ray mic
rodiffraction using the 004 diffraction peak of both the Si1-xGex layer and
the Si(001) substrate. At the Si1-xGex layer peak, a decrease in the diffr
acted intensity is found at dislocations, with features as narrow as 4 mum.
Similar features are seen using the Si peak; however, the diffracted inten
sity increases at the dislocations. We discuss the intensity contrast mecha
nisms and demonstrate that the distortion of the crystal lattice from the d
islocations extends throughout the entire epitaxial layer structure. (C) 20
01 American Institute of Physics.