Scanning x-ray microtopographs of misfit dislocations at SiGe/Si interfaces

Citation
Pm. Mooney et al., Scanning x-ray microtopographs of misfit dislocations at SiGe/Si interfaces, APPL PHYS L, 79(15), 2001, pp. 2363-2365
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
15
Year of publication
2001
Pages
2363 - 2365
Database
ISI
SICI code
0003-6951(20011008)79:15<2363:SXMOMD>2.0.ZU;2-U
Abstract
Misfit dislocations at Si1-xGex/Si interfaces have been imaged by x-ray mic rodiffraction using the 004 diffraction peak of both the Si1-xGex layer and the Si(001) substrate. At the Si1-xGex layer peak, a decrease in the diffr acted intensity is found at dislocations, with features as narrow as 4 mum. Similar features are seen using the Si peak; however, the diffracted inten sity increases at the dislocations. We discuss the intensity contrast mecha nisms and demonstrate that the distortion of the crystal lattice from the d islocations extends throughout the entire epitaxial layer structure. (C) 20 01 American Institute of Physics.