The fractal dimension of boron-doped diamond films

Citation
Llg. Silva et al., The fractal dimension of boron-doped diamond films, APPL SURF S, 181(3-4), 2001, pp. 327-330
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
181
Issue
3-4
Year of publication
2001
Pages
327 - 330
Database
ISI
SICI code
0169-4332(20010921)181:3-4<327:TFDOBD>2.0.ZU;2-Z
Abstract
Boron-doped diamond films were grown by hot-filament-assisted chemical vapo r deposition (CVD). The fractal dimension (FD) of these films was investiga ted by atomic force microscope and cyclic voltammetry. The scaling behavior is measured for peak current in cyclic voltammetry, height-height correlat ions and island size distribution in AFM images. Cyclic voltammetry experim ents and the mass-radius (or island distribution) analysis have evidenced F D values lower than two suggesting non-contiguous chemically active sites. (C) 2001 Elsevier Science B.V. All rights reserved.