Influence of plasma resistance and fluctuation on probe characteristics indetached recombining plasmas

Citation
N. Ohno et al., Influence of plasma resistance and fluctuation on probe characteristics indetached recombining plasmas, CONTR PLASM, 41(5), 2001, pp. 473-480
Citations number
8
Categorie Soggetti
Physics
Journal title
CONTRIBUTIONS TO PLASMA PHYSICS
ISSN journal
08631042 → ACNP
Volume
41
Issue
5
Year of publication
2001
Pages
473 - 480
Database
ISI
SICI code
0863-1042(2001)41:5<473:IOPRAF>2.0.ZU;2-3
Abstract
In order to find the causes of the strong anomaly of current-voltage charac teristics of Langmuir probe observed in detached recombining plasmas in a l inear divertor plasma simulator, NAGDIS-II, we have investigated plasma res istance along a magnetic field and potential fluctuations in the detached r ecombining plasmas. Simple calculation on the ratio between the plasma leng th, at which plasma resistance and resistance of ion sheath formed around a probe tip become equal, and an electron collection length indicates that t he evaluation of electron temperature T-e becomes inaccurate at Te of less than 0.6 eV when plasma density and neutral pressure are 1.0 x 10(18) m(-3) and 10 mtorr, respectively. The potential fluctuation in detached recombin ing plasmas was found to be so large compared to T-e/e, which can also modi fy the probe characteristics.