A multilayer reflectarray composed of two stacked arrays with rectangular p
atches of variable size is demonstrated. A progressive phase distribution o
n the reflector surface is achieved by adjusting the dimensions of the patc
hes. The phase of the reflection coefficient at each element is computed by
the method of moments in the spectral domain, assuming local periodicity.
A technique is presented for the design of dual polarization reflectarrays
that yields all the dimensions for the photo-etching mask. A prototype has
been design, built and measured, and a superior bandwidth performance has b
een verified, compared to conventional single layer reflectarrays.