Surface morphology and growth mechanism of YBa2Cu3O7 films by chemical vapor deposition in a magnetic field

Citation
Yw. Ma et al., Surface morphology and growth mechanism of YBa2Cu3O7 films by chemical vapor deposition in a magnetic field, J CRYST GR, 233(3), 2001, pp. 483-489
Citations number
22
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
233
Issue
3
Year of publication
2001
Pages
483 - 489
Database
ISI
SICI code
0022-0248(200112)233:3<483:SMAGMO>2.0.ZU;2-F
Abstract
We have investigated the influence of a magnetic field on YBa2CU3O7 (YBCO) films grown directly on polycrystalline silver substrates by metalorganic c hemical vapor deposition (CVD). Clearly, application of a magnetic field du ring the CVD process not only changed the surface morphology of YBCO films, but also improved their crystallinity and grain connectivity. Furthermore, it is found that the growth mechanism of YBCO films was changed from the s piral growth mode at zero field to the 2D or 3D island growth mode under an external magnetic field. A discussion on the mechanism of this field-induc ed growth mode change is also presented. (C) 2001 Elsevier Science B.V. All rights reserved.