Citation
K. Domansky et al., Chemical sensors based on dielectric response of functionalized mesoporoussilica films, J MATER RES, 16(10), 2001, pp. 2810-2816
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS RESEARCH
ISSN journal
08842914
→ ACNP
Volume
16
Issue
10
Year of publication
2001
Pages
2810 - 2816
Database
ISI
SICI code
0884-2914(200110)16:10<2810:CSBODR>2.0.ZU;2-O
Abstract
Dielectric response of mesoporous silica films was monitored as a function
of several gas-phase chemical species. The effects of humidity, ammonia, an
d methane on dielectric constant and dissipation factor of films subjected
to different chemical treatments are described. Dielectric constant and dis
sipation factor of partially dehydroxylated films were found to be highly s
ensitive to both water vapor and ammonia in air. The capacitive devices bas
ed on mesoporous silica films show potential for use in chemical sensors.