Bd. Fleming et al., Slow organization of cationic surfactant adsorbed to silica from solutionsfar below the CMC, J PHYS CH B, 105(39), 2001, pp. 9537-9540
The aggregation of hexadecyltrimethylammonium bromide, CTAB, on silica at p
H 9.6 +/- 0.4 has been shown, using optical reflectometry and AFM, to occur
at a significantly lower concentration than is seen at neutral pH. This lo
wer critical surface aggregation concentration, CSAC, results from the incr
eased surface charge of the silica. Although this concept is not new, AFM h
as provided the first direct evidence of lateral organization of adsorbed s
urfactant at an order of magnitude below the cmc. This confirms that a thre
shold surface concentration of adsorbed surfactant is required to initiate
surface aggregation. Specifically, on silica an adsorbed density of 0.6 mg/
m(2) is sufficient for hydrophobic interactions between neighboring adsorba
tes. This promotes adsorption beyond that required to balance the surface c
harge, and hence the formation of surface aggregates. In addition, slow ads
orption is observed in the vicinity of the CSAC as reported recently at neu
tral pH. The results confirm that surface aggregation is not a simple funct
ion of the bulk surfactant concentration, but rather a complex function of
surface charge characteristics in the case of oppositely charged surfactant
s adsorbed to silica.