Near-surface generation of negative ions in low-pressure discharges

Citation
E. Stoffels et al., Near-surface generation of negative ions in low-pressure discharges, J VAC SCI A, 19(5), 2001, pp. 2109-2115
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
19
Issue
5
Year of publication
2001
Pages
2109 - 2115
Database
ISI
SICI code
0734-2101(200109/10)19:5<2109:NGONII>2.0.ZU;2-N
Abstract
Formation processes of negative ions in low-pressure plasmas are not yet fu lly understood: as a rule experiments reveal higher negative ion density th an predicted by the models. In this work we report near-surface generation of negative ions. This hitherto neglected formation mechanism appears to be important in low-pressure discharges and can have large impacts on the bul k plasma chemistry. We monitor energy-resolved positive and negative ion fl uxes arriving at the electrodes in an oxygen parallel-plate radio-frequency (rf, 13.56 MHz) and dc glow plasmas by means of a quadrupole mass spectrom eter. Negative ions formed in the plasma volume are observed by extracting them through an orifice in the anode of a dc glow discharge. Unexpectedly, we record large negative ion signals at the cathode of a dc discharge and a t the grounded electrode of an rf discharge. These ions are formed in the p lasma sheath, in collision processes involving high-energy species. We prop ose an efficient mechanism of negative ion generation due to ion pair forma tion in the sheath. (C) 2001 American Vacuum Society.