Citation
Ys. Chang et Jm. Ting, Characteristics of zinc oxide deposited on copper metallized Si substrates, J VAC SCI A, 19(5), 2001, pp. 2142-2148
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101
→ ACNP
Volume
19
Issue
5
Year of publication
2001
Pages
2142 - 2148
Database
ISI
SICI code
0734-2101(200109/10)19:5<2142:COZODO>2.0.ZU;2-F
Abstract
Sputter deposition of ZnO on Si specimens with surface metallization of cop
per was performed using a radio frequency sputter deposition technique usin
g various deposition temperatures and ratio of O-2/Ar. Copper metallization
was carried out using an ion beam sputter deposition technique at differen
t temperatures. Specimens were analyzed for the thickness, crystal structur
e, microstructure, and composition. Effects of deposition variables were di
scussed. (C) 2001 American Vacuum Society.