Adsorption of oxygen on ultrathin Cu/Pt(111) films

Citation
Js. Tsay et al., Adsorption of oxygen on ultrathin Cu/Pt(111) films, J VAC SCI A, 19(5), 2001, pp. 2217-2221
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
19
Issue
5
Year of publication
2001
Pages
2217 - 2221
Database
ISI
SICI code
0734-2101(200109/10)19:5<2217:AOOOUC>2.0.ZU;2-D
Abstract
Adsorption of oxygen on ultrathin Cu/Pt(111) films was studied using Auger electron spectroscopy, low-energy electron diffraction, and quadrupole mass spectroscopy. Comparing the oxygen-saturated copper films, the density of adsorbed oxygen is doubled as the copper coverage is reduced from 2 to 0.4 monolayers. In the submonolayer range, the more edge sites at the copper is lands and larger Cu-Cu distances due to pseudomorphic growth provide a high er possibility for the adsorption of oxygen. A different adsorption rate of oxygen was resolved for the exposure of copper films to oxygen. As oxygen starts to incorporate into the film, the adsorption rate decreases. For a f ilm prepared by alternate steps of copper deposition and oxygen adsorption, the oxygen distribution is not homogeneous from sputter profiling measurem ents. The amount of oxygen at both interfaces is higher than within the fil m. From the study of the annealing effects for Cu/Pt(111), the onset of dif fusion for Cu adatoms into the Pt(111) substrate is slightly influenced by oxygen. (C) 2001 American Vacuum Society.