Adsorption of oxygen on ultrathin Cu/Pt(111) films was studied using Auger
electron spectroscopy, low-energy electron diffraction, and quadrupole mass
spectroscopy. Comparing the oxygen-saturated copper films, the density of
adsorbed oxygen is doubled as the copper coverage is reduced from 2 to 0.4
monolayers. In the submonolayer range, the more edge sites at the copper is
lands and larger Cu-Cu distances due to pseudomorphic growth provide a high
er possibility for the adsorption of oxygen. A different adsorption rate of
oxygen was resolved for the exposure of copper films to oxygen. As oxygen
starts to incorporate into the film, the adsorption rate decreases. For a f
ilm prepared by alternate steps of copper deposition and oxygen adsorption,
the oxygen distribution is not homogeneous from sputter profiling measurem
ents. The amount of oxygen at both interfaces is higher than within the fil
m. From the study of the annealing effects for Cu/Pt(111), the onset of dif
fusion for Cu adatoms into the Pt(111) substrate is slightly influenced by
oxygen. (C) 2001 American Vacuum Society.