Zh. Ma et al., Electroless plating of copper on poly(tetrafluoroethylene) films modified by NH3 plasma and surface graft copolymerization with aniline, J VAC SCI A, 19(5), 2001, pp. 2471-2478
Electroless plating of copper on poly(tetrafluoroethylene) (PTFE) films mod
ified by NH3 plasma treatment and surface graft copolymerization with anili
ne had been carried out. For the electroless plating of copper, the polyani
line (PANI)-grafted PTFE (PANI-g-PTFE) surface, with the PANI in its fully
reduced leucoemeraldine form, was activated directly in the Pd(NO3)(2) acid
solution in the absence of prior sensitization by SnCl2. The compositions
and chemical states of the PTFE surfaces during each stage of the surface m
odification, surface activation, and electroless deposition processes were
studied by x-ray photoelectron spectroscopy (XPS). The adhesion strength of
the electroless deposited copper on the PANI-g-PTFE surface exhibited a st
rong dependence on the graft concentration of PANI. A T-peel adhesion stren
gth of about 5 N/cm was achieved for the electrolessly deposited Cu on the
PANI-g-PTFE surface (the Cu/PANI-g-PTFE assembly). The high adhesion streng
th of the Cu/PANI-g-PTFE assembly was attributed to the synergistic effects
of strong interactions between the grafted aniline polymer and the metal (
including Pd) atoms, the spatial distribution of the PANI chains in the met
al matrix, and the fact that the polyaniline chains were covalently tethere
d on the PTFE surface. XPS results also revealed that the Cu/PANI-g-PTFE as
semblies delaminated by cohesive failure inside the PTFE film. (C) 2001 Ame
rican Vacuum Society.