Measurement of carbon film thickness by inelastic electron scatter

Citation
Ce. Bryson et al., Measurement of carbon film thickness by inelastic electron scatter, J VAC SCI A, 19(5), 2001, pp. 2695-2697
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
19
Issue
5
Year of publication
2001
Pages
2695 - 2697
Database
ISI
SICI code
0734-2101(200109/10)19:5<2695:MOCFTB>2.0.ZU;2-I
Abstract
The electron spectra obtained from magnetic media coated with carbon films of varying thickness are presented. Electrons backscattered inelastically d ominate the spectra. The intensity of the elastic peak varies in accordance with the Beer/Lambert law and escape depths of 30 and 43 Angstrom for I an d 2 keV primary beam energies, respectively. The maximum intensity in the i nelastic scatter portion of the spectrum decreases in energy and magnitude with increasing film thickness. The spectral differences associated with ch anges in carbon film thickness are large and provide an alternative to x-ra y photoelectron spectrometry for quantitative carbon film thickness measure ment. (C) 2001 American Vacuum Society.