Non contact surface potential measurements for charging reduction during manufacturing of metal-insulator-metal capacitors

In this paper, charging induced damage (CID) to metal-insulator-metal-capac itor (MIMC), is reported. The damage is caused by the build up of charges o n an oxide surface during a water rinsing step. The excessive charging over a large capacitor area results in a discharge over the inter metal dielect ric layer (IMD) towards a grounded structure, This CID leads to direct seve re yield loss. The charging has been detected, measured and reduced with th e help of a non contact surface potential measurement. In this way further yield losses have been prevented. A model for the relation between the surf ace charging potential and the voltage difference between the capacitor and the grounded structure is presented. (C) 2001 Elsevier Science Ltd. All ri ghts reserved.