Volatile metal alkylamides serve as precursors for vapor deposition of high-dielectric-constant gate insulator materials

Authors
Maye, MM
Citation
Mm. Maye, Volatile metal alkylamides serve as precursors for vapor deposition of high-dielectric-constant gate insulator materials, MRS BULL, 26(9), 2001, pp. 660-661
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MRS BULLETIN
ISSN journal
08837694 → ACNP
Volume
26
Issue
9
Year of publication
2001
Pages
660 - 661
Database
ISI
SICI code
0883-7694(200109)26:9<660:VMASAP>2.0.ZU;2-K