An RF power amplifier in a digital CMOS process

Citation
P. Asbeck et C. Fallesen, An RF power amplifier in a digital CMOS process, ANALOG IN C, 30(1), 2002, pp. 41-50
Citations number
17
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
ANALOG INTEGRATED CIRCUITS AND SIGNAL PROCESSING
ISSN journal
09251030 → ACNP
Volume
30
Issue
1
Year of publication
2002
Pages
41 - 50
Database
ISI
SICI code
0925-1030(200201)30:1<41:ARPAIA>2.0.ZU;2-2
Abstract
A two stage class B power amplifier for 1.9 GHz is presented. The amplifier is fabricated in a standard digital EPI-CMOS process with low resistivity substrate. The measured output power is 29 dBm in a 50 Omega load. A design method to find the large signal parameters of the output transistor is pre sented. It separates the determination of the optimal load resistance and t he determination of the large signal drain-source capacitance. Based on thi s method, proper values for on-chip interstage matching and off-chip output matching can be derived. A envelope linearisation circuit for the PA is pr oposed. Simulations and measurements of a fabricated linearisation circuit are presented and used to calculate the achievable linearity in terms of th e spectral leakage and the error vector magnitude of a EDGE (3 pi /8-8PSK) modulated signal.