Influence of microstructure on the carrier concentration of Mg-doped GaN films

Citation
Lt. Romano et al., Influence of microstructure on the carrier concentration of Mg-doped GaN films, APPL PHYS L, 79(17), 2001, pp. 2734-2736
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
17
Year of publication
2001
Pages
2734 - 2736
Database
ISI
SICI code
0003-6951(20011022)79:17<2734:IOMOTC>2.0.ZU;2-3
Abstract
Room-temperature Hall effect measurements of (0001) Mg-doped GaN films grow n on sapphire substrates by metalorganic chemical vapor deposition show a r eduction in hole concentration for Mg concentrations greater than 10(20) cm (-3). A combination of secondary ion mass spectrometry and transmission ele ctron microscopy indicates a steadily increasing Mg incorporation during gr owth and the formation of inversion domains at these high concentrations. W e discuss mechanisms that could give rise to a reduction of the hole concen tration at high Mg doping levels. (C) 2001 American Institute of Physics.