Photovoltaic response and dielectric properties of epitaxial anatase-TiO2 films grown on conductive La0.5Sr0.5CoO3 electrodes

Citation
Bh. Park et al., Photovoltaic response and dielectric properties of epitaxial anatase-TiO2 films grown on conductive La0.5Sr0.5CoO3 electrodes, APPL PHYS L, 79(17), 2001, pp. 2797-2799
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
17
Year of publication
2001
Pages
2797 - 2799
Database
ISI
SICI code
0003-6951(20011022)79:17<2797:PRADPO>2.0.ZU;2-G
Abstract
We have grown epitaxial anatase-TiO2 (001) films on La0.5Sr0.5CoO3 (001) bo ttom electrodes using pulsed-laser deposition. The small lattice mismatch ( 0.5%) between the anatase-TiO2 and the La0.5Sr0.5CoO3 makes it possible to grow anatase-TiO2 films with excellent crystallinity on conductive metal ox ides. The photovoltaic properties of the epitaxial anatase-TiO2 on the La0. 5Sr0.5CoO3 were characterized using a Kelvin probe. The optical band-gap en ergy was found to be 3.05 eV. The dielectric properties of the epitaxial an atase-TiO2 films were characterized using a capacitor structure of Au/anata se-TiO2/La0.5Sr0.5CoO3 on a LaAlO3 substrate. The dielectric dispersion exh ibited a power-law dependence, and the dielectric constant measured at room temperature and 1 MHz was 38. (C) 2001 American Institute of Physics.