Thermal stability and diffusion in gadolinium silicate gate dielectric films

Gadolinium silicate films on Si(100) annealed in oxygen and vacuum at tempe ratures up to 800 degreesC were analyzed by Rutherford backscattering and n arrow resonance nuclear profiling. Oxygen diffused into the film eliminatin g oxygen vacancies, but Si diffusion, previously observed in Al and Y oxide s and in La and Zr silicate films, was absent. Higher-temperature annealing in oxygen resulted in the formation of an interfacial layer observable in high-resolution electron micrographs. Gd0.23Si0.14O0.63 films crystallize a t temperatures between 1000 and 1050 degreesC. These observations combined with recent electrical measurements show that gadolinium silicate films may be a good candidate for the replacement of SiO2 in deep submicron metal-ox ide-semiconductor gates.