Dissociation of grain boundary dislocations in SrBi2Ta2O9 ferroelectric thin films (vol 79, pg 1345, 2001)

Authors
Zhu, XH Zhu, JM Zhou, SH Li, Q Liu, ZG Ming, NB
Citation
Xh. Zhu et al., Dissociation of grain boundary dislocations in SrBi2Ta2O9 ferroelectric thin films (vol 79, pg 1345, 2001), APPL PHYS L, 79(16), 2001, pp. 2666-2666
Citations number
1
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
16
Year of publication
2001
Pages
2666 - 2666
Database
ISI
SICI code
0003-6951(20011015)79:16<2666:DOGBDI>2.0.ZU;2-#