Preparation of multilayered Co/Pd nanostructure films by electroplating and their magnetic properties
Citation
K. Kudo et al., Preparation of multilayered Co/Pd nanostructure films by electroplating and their magnetic properties, ELECTR ACT, 47(1-2), 2001, pp. 353-357
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
ELECTROCHIMICA ACTA
SICI code
0013-4686(20010901)47:1-2<353:POMCNF>2.0.ZU;2-5
Abstract
Multilayered fcc Co/Pd nanostructure films, prepared by electrodeposition o
n an electropolished polycrystalline copper substrate using a dual cell met
hod, exhibit a remanent perpendicular magnetic anisotropy which depends on
the Co film thickness. By decreasing the Co layer thickness and setting the
Pd monolayer thickness as I nm, the remanent magnetic ratio (the ratio of
the remanent magnetization perpendicular to the film plane in relation to t
hat found on the plane of the film) became large and exceeded I for a Co la
yer thickness of about 0.4 nm, which indicates that the easy axis of magnet
ization of the multilayered film changed from a direction parallel to the f
ilm plane to a direction perpendicular to it at this Co film thickness. The
magnetic behavior of the heat treated Co/Pd multilayered film was measured
and discussed. (C) 2001 Published by Elsevier Science Ltd.