Review of technology for 157-nm lithography

Authors
Bates, AK Rothschild, M Bloomstein, TM Fedynyshyn, TH Kunz, RR Liberman, V Switkes, M
Citation
Ak. Bates et al., Review of technology for 157-nm lithography, IBM J RES, 45(5), 2001, pp. 605-614
Citations number
22
Categorie Soggetti
Multidisciplinary,"Computer Science & Engineering
Journal title
IBM JOURNAL OF RESEARCH AND DEVELOPMENT
ISSN journal
00188646 → ACNP
Volume
45
Issue
5
Year of publication
2001
Pages
605 - 614
Database
ISI
SICI code
0018-8646(200109)45:5<605:ROTF1L>2.0.ZU;2-N
Abstract
This paper outlines the critical issues facing the implementation of 157-nm lithography as a sub-100-nm technology. The status of the present technolo gy for mask materials, pellicles, optical materials, coatings, and resists is presented.