Formation of submicron cylindrical structures at silicon surface exposed to a compression plasma flow

Authors
Uglov, VV Anishchik, VM Astashynski, VV Astashynski, VM Ananin, SI Askerko, VV Kostyukevich, EA Kuz'mitski, AM Kvasov, NT Danilyuk, AL
Citation
Vv. Uglov et al., Formation of submicron cylindrical structures at silicon surface exposed to a compression plasma flow, JETP LETTER, 74(4), 2001, pp. 213-215
Citations number
13
Categorie Soggetti
Physics
Journal title
JETP LETTERS
ISSN journal
00213640 → ACNP
Volume
74
Issue
4
Year of publication
2001
Pages
213 - 215
Database
ISI
SICI code
0021-3640(2001)74:4<213:FOSCSA>2.0.ZU;2-4
Abstract
Submicron-sized cylindrical structures were obtained at the surface of sili con single crystal exposed to a compression plasma flow. A periodic structu re formed by channels oriented normally to the surface was observed inside the modified surface layer. The period of the structure corresponded to the spacing of the surface formations. (C) 2001 MAIK "Nauka/Interperiodica".