Synthesis of GaN quantum dots by ion implantation in dielectrics

Citation
E. Borsella et al., Synthesis of GaN quantum dots by ion implantation in dielectrics, J APPL PHYS, 90(9), 2001, pp. 4467-4473
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
90
Issue
9
Year of publication
2001
Pages
4467 - 4473
Database
ISI
SICI code
0021-8979(20011101)90:9<4467:SOGQDB>2.0.ZU;2-S
Abstract
GaN nanocrystals (in the wurtzite phase) were synthesized by sequential imp lantation of Ga and N ions into either crystalline (quartz, sapphire) or am orphous (silica) dielectrics, followed by annealing of the samples in flowi ng NH3 gas at 900 degreesC. GaN was formed by reaction of implanted Ga with NH3 combustion products and/or via conversion of Ga oxide/oxynitrides. A b lueshift of the near-band-edge photoluminescence (quantum-confinement effec t) was observed for GaN nanocrystals with size less than or equal to2-3 nm, present in all the substrates. (C) 2001 American Institute of Physics.