Fabrication and characterization of epitaxial NbN/MgO/NbN Josephson tunneljunctions

Citation
A. Kawakami et al., Fabrication and characterization of epitaxial NbN/MgO/NbN Josephson tunneljunctions, J APPL PHYS, 90(9), 2001, pp. 4796-4799
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
90
Issue
9
Year of publication
2001
Pages
4796 - 4799
Database
ISI
SICI code
0021-8979(20011101)90:9<4796:FACOEN>2.0.ZU;2-8
Abstract
We fabricated epitaxial NbN/MgO/NbN Josephson tunnel junctions with good tu nneling characteristics in the range of J(C)=0.2-70 kA/cm(2). The counter a nd base NbN electrodes of the tunnel junctions had the same T-C and 20 K re sistivity at about 15.7 K and 60 mu Omega -cm, respectively. X-ray analysis showed that all the layers that formed the tunnel junctions grew epitaxial ly. In the range of J(C)=0.2-15 kA/cm(2), the tunnel junctions fabricated h ad large gap voltages (5.6-5.9 mV), narrow gap widths (less than 0.1 mV), h igh ICRN products (2.6-3.8 mV), and small subgap leakage current (V-m=40-96 mV). (C) 2001 American Institute of Physics.