Plasma potential in the presence of an external electric field

Citation
H. Kurosawa et al., Plasma potential in the presence of an external electric field, J APPL PHYS, 90(8), 2001, pp. 3713-3719
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
90
Issue
8
Year of publication
2001
Pages
3713 - 3719
Database
ISI
SICI code
0021-8979(20011015)90:8<3713:PPITPO>2.0.ZU;2-J
Abstract
We studied the mechanism and behavior of a plasma in the presence of an ext ernal electric field with a one-dimensional fluid model. We used a two-flui d model, treating both electron and ion motions, rather than a commonly use d one-fluid model assuming the electron thermal equilibrium. In particular, we investigated the following issues: (1) the motion of plasma electrons c aused by an external static electric field and the formation of a plasma po tential; (2) influence of parameters on the plasma potential, which are pla sma electron temperature, plasma density, and applied voltage. The plasma p otential rises and reaches a value nearly equal to the anode potential in a few nanoseconds. It is higher for a higher anode potential, a higher elect ron temperature, and a lower plasma density. (C) 2001 American Institute of Physics.