Stitching-error reduction in gratings by shot-shifted electron-beam lithography

Authors
Dougherty, DJ Muller, RE Maker, PD Forouhar, S
Citation
Dj. Dougherty et al., Stitching-error reduction in gratings by shot-shifted electron-beam lithography, J LIGHTW T, 19(10), 2001, pp. 1527-1531
Citations number
7
Categorie Soggetti
Optics & Acoustics
Journal title
JOURNAL OF LIGHTWAVE TECHNOLOGY
ISSN journal
07338724 → ACNP
Volume
19
Issue
10
Year of publication
2001
Pages
1527 - 1531
Database
ISI
SICI code
0733-8724(200110)19:10<1527:SRIGBS>2.0.ZU;2-C
Abstract
Calculations of the grating spatial-frequency spectrum and the filtering pr operties of multiple-pass electron-beam writing demonstrate a tradeoff betw een stitching-error suppression and minimum pitch separation. High-resoluti on measurements of optical-diffraction patterns show a 25-dB reduction in s titching-error side modes.