Effect of a magnetic field on electrodeposition - Chronoamperometry of Ag,Cu, Zn, and Bi

Citation
C. O'Reilly et al., Effect of a magnetic field on electrodeposition - Chronoamperometry of Ag,Cu, Zn, and Bi, J ELCHEM SO, 148(10), 2001, pp. C674-C678
Citations number
15
Categorie Soggetti
Physical Chemistry/Chemical Physics","Material Science & Engineering
Journal title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
ISSN journal
00134651 → ACNP
Volume
148
Issue
10
Year of publication
2001
Pages
C674 - C678
Database
ISI
SICI code
0013-4651(200110)148:10<C674:EOAMFO>2.0.ZU;2-E
Abstract
The transient current response following a stepwise decrease of potential f rom the rest potential is studied for solutions of Ag+, Zn2+, Cu2+, and Bi3 +, comparing the behavior in the presence and absence of a 0.5 T magnetic f ield. In all cases, regardless of whether ions are paramagnetic (Cu2+) or d iamagnetic (Ag+, Zn2+, Bi3+), the plating current with a field increases in the Iona-time limit when the potential is stepped into the mass-transport- limited region. The results support the Aogaki model of mass-transport enha ncement due to disruption of the diffusion layer by the Lorentz force j x B . There is no effect of the magnetic field on the diffusion coefficient D d erived from the Cottrell plots. (C) 2001 The Electrochemical Society.