C. O'Reilly et al., Effect of a magnetic field on electrodeposition - Chronoamperometry of Ag,Cu, Zn, and Bi, J ELCHEM SO, 148(10), 2001, pp. C674-C678
The transient current response following a stepwise decrease of potential f
rom the rest potential is studied for solutions of Ag+, Zn2+, Cu2+, and Bi3
+, comparing the behavior in the presence and absence of a 0.5 T magnetic f
ield. In all cases, regardless of whether ions are paramagnetic (Cu2+) or d
iamagnetic (Ag+, Zn2+, Bi3+), the plating current with a field increases in
the Iona-time limit when the potential is stepped into the mass-transport-
limited region. The results support the Aogaki model of mass-transport enha
ncement due to disruption of the diffusion layer by the Lorentz force j x B
. There is no effect of the magnetic field on the diffusion coefficient D d
erived from the Cottrell plots. (C) 2001 The Electrochemical Society.