DEEP-LEVEL CHARACTERIZATION IN SEMIINSULATING GAAS BY PHOTOINDUCED CURRENT AND HALL-EFFECT TRANSIENT SPECTROSCOPY

Citation
K. Yasutake et al., DEEP-LEVEL CHARACTERIZATION IN SEMIINSULATING GAAS BY PHOTOINDUCED CURRENT AND HALL-EFFECT TRANSIENT SPECTROSCOPY, Journal of materials science. Materials in electronics, 8(4), 1997, pp. 239-245
Citations number
29
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Condensed Matter","Material Science
ISSN journal
09574522
Volume
8
Issue
4
Year of publication
1997
Pages
239 - 245
Database
ISI
SICI code
0957-4522(1997)8:4<239:DCISGB>2.0.ZU;2-R
Abstract
Deep levels in semi-insulating (SI) GaAs single crystals were studied by photo-induced current transient spectroscopy (PICTS) and photo-indu ced Hall effect transient spectroscopy (PHETS). A method of measuring the defect level density using PHETS was developed and used to measure the EL6 density in SI-GaAs. Investigations were made into EL2 and EL6 , the main defect levels in SI-GaAs, to find the density distribution in the as-grown wafer and the annealing behaviour in the temperature r ange from 600 to 1100 degrees C. The density distribution of EL2 acros s the wafer showed a so-called W-shaped pattern similar to the disloca tion density, but the EL6 distribution showed an M-shaped pattern. Ann ealing at temperatures from 800 to 1000 degrees C increased the densit y of each level, whereas annealing at 1100 degrees C diminished it. Th ese experimental results were well explained by tentative defect model s for EL2 (AsGaVGa) and EL6 (AsGaAsi).