K. Yasutake et al., DEEP-LEVEL CHARACTERIZATION IN SEMIINSULATING GAAS BY PHOTOINDUCED CURRENT AND HALL-EFFECT TRANSIENT SPECTROSCOPY, Journal of materials science. Materials in electronics, 8(4), 1997, pp. 239-245
Deep levels in semi-insulating (SI) GaAs single crystals were studied
by photo-induced current transient spectroscopy (PICTS) and photo-indu
ced Hall effect transient spectroscopy (PHETS). A method of measuring
the defect level density using PHETS was developed and used to measure
the EL6 density in SI-GaAs. Investigations were made into EL2 and EL6
, the main defect levels in SI-GaAs, to find the density distribution
in the as-grown wafer and the annealing behaviour in the temperature r
ange from 600 to 1100 degrees C. The density distribution of EL2 acros
s the wafer showed a so-called W-shaped pattern similar to the disloca
tion density, but the EL6 distribution showed an M-shaped pattern. Ann
ealing at temperatures from 800 to 1000 degrees C increased the densit
y of each level, whereas annealing at 1100 degrees C diminished it. Th
ese experimental results were well explained by tentative defect model
s for EL2 (AsGaVGa) and EL6 (AsGaAsi).