Photoluminescence (PL) of porous InP formed by electrochemical etching tech
niques is measured at room temperature. Compared to the PL of the bulk InP
wafer, a blueshifted PL emission is observed. It is found that the amount o
f the blueshifted energy depends on the microstructure of porous InP, which
in turn strongly depends on the potential voltage applied during the elect
rochemical etching. Time-resolved PL study of the sample shows that surface
nonradiative recombination is dominant.