The paper presents some examples of interface studies which are intimately
related to progress in III-V semiconductor technology and device physics. O
ptical in-situ investigations of the MOVPE growth of InGaP/InP layers am es
sential for the control of ordering phenomena in these layers which are rel
evant for high performance optoelectronic devices. Interface roughness, whi
ch is an essential parameter for the performance of heterostructure quantum
devices, is a typical topic of interface investigations by e.g. transmissi
on electron microscopy or X-ray scattering. As a further example studies on
electronic interface states on metal/narrow gap III-V semiconductors are p
resented which enabled the successful preparation of semiconductor/supercon
ductor hybrid devices. For group III-nitrides with wurtzite structure the i
nterplay of internal polarisation fields and charges in surface states yiel
ds new challenges in order to understand and control Schottky barrier heigh
ts and 2D confinement in heterostructure FETs.