Qualitative and quantitative study of silicon wafer surfaces using ATR/FTIR spectroscopy

Authors
Chen, JJ Xu, F Ponnuswamy, T Chan, R Wu, JJ Prasad, A Chyan, O Sees, JA Hall, LH
Citation
Jj. Chen et al., Qualitative and quantitative study of silicon wafer surfaces using ATR/FTIR spectroscopy, RRD APPL SP, 3, 2000, pp. 81-95
Categorie Soggetti
Current Book Contents
Journal title
RECENT RESEARCH DEVELOPMENTS IN APPLIED SPECTROSCOPY, VOL 3 → ACNP
Volume
3
Year of publication
2000
Pages
81 - 95
Database
ISI
SICI code