Developments in materials for 157nm photoresists

Authors
Conley, W Dean, K Miller, D Rich, G Graffenberg, V Patel, S Lin, SH Jamieson, A Hung, R Yamada, S Pinnow, M MacDonald, S Chambers, C Osborne, B Patterson, K Somervell, M Trinque, B Tran, HV Cho, S Chiba, T Byers, J Tomas, B Shafer, G DesMarteau, D Klopp, J Frechet, J Sanders, D Grubbs, R Ober, C Korner, H Willson, CG
Citation
W. Conley et al., Developments in materials for 157nm photoresists, SOL ST TECH, 44(10), 2001, pp. 63
Citations number
10
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
SOLID STATE TECHNOLOGY
ISSN journal
0038111X → ACNP
Volume
44
Issue
10
Year of publication
2001
Database
ISI
SICI code
0038-111X(200110)44:10<63:DIMF1P>2.0.ZU;2-1
Abstract
Within the past year, the extension of optical lithography to 157nm has rec eived widespread support because it offers the prospect of improved resolut ion based on decades of optical lithography experience. This article provid es an update on the progress in 157nm, from photoresists to pellicles and e xposure tools.