The effect of the irradiated glass target temperature on the implanted silver distribution profile

Features of the profiles of silver ions implanted into a soda-lime silicate glass were studied depending on the substrate temperature varied in a narr ow range from 20 to 100 degreesC. The implant depth-concentration profiles were modeled with an allowance for a thermostimulated increase in the diffu sion mobility of the implanted impurity in the sample volume. It is shown t hat an increase in the substrate temperature by several tens of degrees lea ds to a diffusion smearing of the implanted impurity profile and, hence, to a decrease in the local implant concentration hindering the metal silver n ucleation. An analysis of the results of modeling points to the need in tho roughly controlling the substrate temperature in order to provide for the r equired conditions of the metal nanoparticle synthesis and to obtain the me tal-glass composites with reproducible characteristics. (C) 2001 MAIK "Nauk a/Interperiodica".