Vi. Merkulov et al., Alignment mechanism of carbon nanofibers produced by plasma-enhanced chemical-vapor deposition, APPL PHYS L, 79(18), 2001, pp. 2970-2972
We report experimental evidence showing a direct correlation between the al
ignment of carbon nanofibers (CNFs) prepared by plasma-enhanced chemical-va
por deposition and the location of the catalyst particle during CNF growth.
In particular, we find that CNFs that have a catalyst particle at the tip
(i.e., growth proceeds from the tip) align along the electric-field lines,
whereas CNFs with the particle at the base (i.e., growth proceeds from the
base) grow in random orientations. We propose a model that explains the ali
gnment process as a result of a feedback mechanism associated with a nonuni
form stress (part tensile, part compressive) that is created across the int
erface of the catalyst particle with the CNF due to electrostatic forces. F
urthermore, we propose that the alignment seen recently in some dense CNF f
ilms is due to a crowding effect and is not directly the result of electros
tatic forces. (C) 2001 American Institute of Physics.