Alignment mechanism of carbon nanofibers produced by plasma-enhanced chemical-vapor deposition

Citation
Vi. Merkulov et al., Alignment mechanism of carbon nanofibers produced by plasma-enhanced chemical-vapor deposition, APPL PHYS L, 79(18), 2001, pp. 2970-2972
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
18
Year of publication
2001
Pages
2970 - 2972
Database
ISI
SICI code
0003-6951(20011029)79:18<2970:AMOCNP>2.0.ZU;2-L
Abstract
We report experimental evidence showing a direct correlation between the al ignment of carbon nanofibers (CNFs) prepared by plasma-enhanced chemical-va por deposition and the location of the catalyst particle during CNF growth. In particular, we find that CNFs that have a catalyst particle at the tip (i.e., growth proceeds from the tip) align along the electric-field lines, whereas CNFs with the particle at the base (i.e., growth proceeds from the base) grow in random orientations. We propose a model that explains the ali gnment process as a result of a feedback mechanism associated with a nonuni form stress (part tensile, part compressive) that is created across the int erface of the catalyst particle with the CNF due to electrostatic forces. F urthermore, we propose that the alignment seen recently in some dense CNF f ilms is due to a crowding effect and is not directly the result of electros tatic forces. (C) 2001 American Institute of Physics.