Na ion-implanted silicon dioxide films are studied by infrared absorption (
IR) and electron paramagnetic resonance (EPR) techniques. The samples were
treated with sequential HF etchings, and subsequent IR and EPR measurements
were made. The spectra are analyzed by principal component analysis (PCA),
two-dimensional correlation analysis QDCA), and effective medium analysis
(EMA). The PCA and 2DCA show that a 1000 cm(-1) band appears in IR spectra
in the silicon dioxide films after ion-implantation. And the 2DCA between I
R and EPR spectra show that the 1000 cm-1 band is strongly correlated with
the E' and/or peroxy radical in depth distribution; therefore, the band can
be assigned to radical related Si-O stretching, such as O=Si . and/or Si-O
-O . configurations. The distribution of these configurations in the as-imp
lanted film is also correlated to that of the voids. However, after anneali
ng, the 1000 cm-1 band drastically diminished but the void volume fraction
was unchanged and remained in the films. Annealing acted to reconstruct the
dangling bonds to Si-O bonding and rearranged the void distribution in the
film, but the volume fraction did not change drastically. The results of E
MA support the depth distribution of the defects calculated from 2DCA.