Sa. Kulinich et al., Highly c-axis oriented LiNb0.5Ta0.5O3 thin films on Si substrates fabricated by thermal plasma spray CVD, APPL SURF S, 182(1-2), 2001, pp. 150-158
Lithium niobate-tantalate films with the composition LiNb0.5Ta0.5O3 and ver
y high c-axis orientation were grown on (1 0 0) and (1 1 1) Si substrates b
y using the thermal plasma spray CVD method. It is demonstrated that the su
bstrate temperature is the key factor governing film orientation and crysta
llinity. The film direction could be varied from (0 0 6) to (0 1 2) by cont
rolling the deposition temperature. Under optimal growth conditions, 97% c-
textured films could be grown on both thick and very thin intermediate SiO2
layers. A (0 0 6) rocking-curve full-width at half-maximum value could ach
ieve 3.7, by using the optimal deposition temperature. The growth rate appl
ied was equal to 160-340 nm/min. (C) 2001 Published by Elsevier Science B.V
.