Highly c-axis oriented LiNb0.5Ta0.5O3 thin films on Si substrates fabricated by thermal plasma spray CVD

Lithium niobate-tantalate films with the composition LiNb0.5Ta0.5O3 and ver y high c-axis orientation were grown on (1 0 0) and (1 1 1) Si substrates b y using the thermal plasma spray CVD method. It is demonstrated that the su bstrate temperature is the key factor governing film orientation and crysta llinity. The film direction could be varied from (0 0 6) to (0 1 2) by cont rolling the deposition temperature. Under optimal growth conditions, 97% c- textured films could be grown on both thick and very thin intermediate SiO2 layers. A (0 0 6) rocking-curve full-width at half-maximum value could ach ieve 3.7, by using the optimal deposition temperature. The growth rate appl ied was equal to 160-340 nm/min. (C) 2001 Published by Elsevier Science B.V .