Numerical modelling of the excitation energy dependence of adsorbate photochemistry at metal surfaces

Citation
T. Vondrak et al., Numerical modelling of the excitation energy dependence of adsorbate photochemistry at metal surfaces, CHEM P LETT, 347(1-3), 2001, pp. 1-7
Citations number
35
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
CHEMICAL PHYSICS LETTERS
ISSN journal
00092614 → ACNP
Volume
347
Issue
1-3
Year of publication
2001
Pages
1 - 7
Database
ISI
SICI code
0009-2614(20011019)347:1-3<1:NMOTEE>2.0.ZU;2-J
Abstract
The energy dependence of the photodesorption cross-section in the OCS/Ag(11 1) system is interpreted in terms of the hot electron attachment model incl uding the electron cascade process and the substrate absorbance. An electro n attachment level 3 eV above the Fermi level gives the best fit of the exp erimental action spectrum. The sensitivity of the fit to a variety of param eters is analysed. The fit is a strong function of attachment level energy. The weight of other parameters (attachment level width, surface-adsorbate barrier, secondary electron cascade profile) is less significant. It is sho wn that the model may reproduce the reported universal wavelength dependenc e of photodesorption on different metal substrates only if the attachment l evel is located a constant distance from the metal Fermi level. (C) 2001 El sevier Science B.V. All rights reserved.