Ab initio electron affinities of AlH, SiH, GaH, and GeH, including characterization of bound excited states of SiH- and GeH-

Authors
Citation
De. Woon et Dr. Beck, Ab initio electron affinities of AlH, SiH, GaH, and GeH, including characterization of bound excited states of SiH- and GeH-, CHEM P LETT, 347(1-3), 2001, pp. 255-260
Citations number
25
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
CHEMICAL PHYSICS LETTERS
ISSN journal
00092614 → ACNP
Volume
347
Issue
1-3
Year of publication
2001
Pages
255 - 260
Database
ISI
SICI code
0009-2614(20011019)347:1-3<255:AIEAOA>2.0.ZU;2-I
Abstract
Ab initio benchmark calculations are reported for the diatomic hydrides of Al, Si, Ga, and Ge and their negative ions using correlation consistent bas is sets and several correlated methods. Adiabatic electron affinities for t he 0-0 transition were found to be 0.193, 1.256, 0.131, and 1.251 eV for AM , SiH, GaH, and GeH, respectively, at the RCCSD(T)/aug-cc-pVQZ level of the ory. Excitation energies (TO) of the a(1)Delta and b(1)Sigma (+) bound exci ted states were found to be 0.560 and 1.017 eV for SiH- and 0.595 and 1.026 eV for GeH- at the MRCI + Q/aug-cc-pVQZ level. Selected spectroscopic cons tants are reported for the eight negative ion states, (C) 2001 Elsevier Sci ence B.V. All rights reserved.