Interlayer segregation of Cu atoms in metal multilayers

Citation
Gh. Yu et al., Interlayer segregation of Cu atoms in metal multilayers, CHIN PHYS L, 18(9), 2001, pp. 1245-1248
Citations number
22
Categorie Soggetti
Physics
Journal title
CHINESE PHYSICS LETTERS
ISSN journal
0256307X → ACNP
Volume
18
Issue
9
Year of publication
2001
Pages
1245 - 1248
Database
ISI
SICI code
0256-307X(200109)18:9<1245:ISOCAI>2.0.ZU;2-M
Abstract
The experimental results show that the exchange coupling field H.. of NiFe/ FeMn for TalNiFe/FeMn/Ta multilayers is higher than that for the spin valve multilayers Ta/NiFe/Cu/NiFe/FeMn/Ta. The composition and chemical states a t the surface of Ta(12nm)/NiFe(7nm), Th(12nm)/NiFe(7nm)/Cu(4nm) and Ta(12nm )/NiFe(7nm)/Cu(3 nm)/NiFe(5 mn) were studied by using x-ray photoelectron s pectroscopy. The results show that no element from the underlayers Boats ou t or segregates to the surface for Th(12 nm)/NiFe(7nm), Ta(12 nm)/NiFe(7nm) /Cu(4 mn). However, Cu atoms segregate to the surface of Ta(12 nm)/NiFe(7nm )/Cu(3nm)/NiFe(5nm) multilayers, i.e. to the NiFe/FeMn interface for Ta/NiF e/Cu/NiFe/FeMn/Ta multilayers. We believe that the presence of Cu atoms at the interface of NiFe/FeMn is one of the important factors which will cause the exchange coupling field H.. of Ta/NiFe/FeMn/Ta multilayers to be highe r than that of Ta/NiFe/Cu/NiFe/FeMn/Ta multilayers.